Angstrom Sciences, Inc.


About

Angstrom Sciences supplies high performance magnetron sputter sources and PVD materials for a wide variety of thin film applications. Patented designs such as profiled magnets, turbulent water flow, and threaded target clamping permit high target utilization and deposition rates with uncompromised film quality. 

 
With a strong product focus and a commitment to R&D Angstrom Sciences has developed the broadest range of circular, linear, and cylindrical magnetron sputtering cathodes available. 
 
Magnetron Sputtering Technology & Sputtering Materials
 

Mark Bernick founded Angstrom Sciences, Inc. in 1988 to supply advanced magnetrons and refined materials for plasma vapor deposition of high quality thin films. With a strong focus on research and development, the company soon patented several technical advancements in magnetics, water-cooling, and circular magnetron target clamping designs. The features of the Angstrom Advantage™ have created the most advanced and easy-to-use magnetrons in the thin film industry.

 

Click here for a comprehensive overview of our capabilities and technical advantages.

 

 

 Magnetron Sputtering Products

Angstrom Sciences’ magnetrons have been enthusiastically received in a wide variety of R&D and production applications.

 

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Magnetron Sputtering Technologies

Cutting edge technology provides superior performance in all types of plasma vapor deposition processes.  

     

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The Angstrom Advantage

Patented technology that yields uncompromising results through innovation and long term application experience.                                

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Contact

40 South Linden Street
15110
United States of America

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